Discussion on: Continuous Low-level Chlorine Dioxide Gas Exposure and Curing Treatment on Sweet Potato Spoilage during Storage: A Pilot Study under Practical Warehouse Conditions

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Article Title

Continuous Low-level Chlorine Dioxide Gas Exposure and Curing Treatment on Sweet Potato Spoilage during Storage: A Pilot Study under Practical Warehouse Conditions

Authored by

Yo Ishigaki
Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kouhoku-ku, Yokohama-shi, Kanagawa 223-8522, Japan and Research Center for Realizing Sustainable Societies, The University of Electro-Communications, 1-5-1 Chofu-ga-oka, Chofu-shi, Tokyo 182-8585, Japan.

Shigeru Ishijima
Tsukuba Yacon Co., Ltd., 4895 Yoshinuma, Tsukuba-shi, Ibaraki 300-2617, Japan.

Yoshinari Miura
Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kouhoku-ku, Yokohama-shi, Kanagawa 223-8522, Japan.

Kurumi Minagawa
Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kouhoku-ku, Yokohama-shi, Kanagawa 223-8522, Japan.

Sachie Yukawa
Research Center for Realizing Sustainable Societies, The University of Electro-Communications, 1-5-1 Chofu-ga-oka, Chofu-shi, Tokyo 182-8585, Japan.

Daisuke Nakayama
NSW Inc., 31-11, Sakuragaoka-cho, Shibuya-ku, Tokyo 150-8577, Japan.

Mitsuharu Sakamoto
NSW Inc., 31-11, Sakuragaoka-cho, Shibuya-ku, Tokyo 150-8577, Japan.

Chihiro Watanabe
NSW Inc., 31-11, Sakuragaoka-cho, Shibuya-ku, Tokyo 150-8577, Japan.

Tomoaki Okuda
Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kouhoku-ku, Yokohama-shi, Kanagawa 223-8522, Japan.

DOI or Article Link

https://doi.org/10.9734/afsj/2026/v25i5876

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